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Height measurement of wafer bumps

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved. Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

Height measurement of wafer bumps

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved. Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

Application challenge

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

Measurement method and system

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

Manufacturer source

The problem

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

The method

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

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Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

Up to now, the 50 to 350 µm small bumps are normally inspected by camera systems during production. The decisive disadvantage of this method is that only the presence or position is checked. The height can only be determined offline, by means of sections taken with a measuring microscope. Therefore, confocal chromatic sensors from Micro-Epsilon are used here. These measure precisely on the shiny and structured surfaces of the computer chips. Thanks to the focused light spot, a high lateral resolution of around 4 µm is also achieved.

The described camera inspection checked presence and position, while height previously required offline section measurements. Confocal sensors add height measurement on the chip surface.

The application uses Micro-Epsilon confocal chromatic sensors on shiny, structured surfaces. The described bumps are 50–350 µm in size.

It is the application’s lateral-resolution figure, associated with the focused light spot. It is not a height-accuracy or axial-resolution specification.

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