Positioning the wafer stage
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields. Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields. Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.
Application challenge
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.
Measurement method and system
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.
The problem
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.
The method
Non-contact sensors from Micro-Epsilon are used for position monitoring of the wafer stage, where they measure highly dynamic XYZ movements of the stage which accelerates very rapidly. Capacitive and inductive (eddy current) sensors achieve nanometer resolution in order to ensure that the wafer is precisely positioned for the exposure process. These innovative sensors can be used in vacuum applications and are insensitive to strong magnetic fields.