Precise characterization of lenses and optical systems for lithography
Wavefront measurements for monitoring and alignment of optical systems. Precise measurements, high intrinsic stability
Precise characterization of lenses and optical systems for lithography is an application documented by Optocraft. This page summarizes the engineering task and the system-selection considerations for an Elina implementation.
Application challenge
Wavefront measurements for monitoring and alignment of optical systems. Precise measurements, high intrinsic stability
Measurement or test approach
The optical system uses wavefront sensing and application-specific optics or illumination to quantify optical quality, alignment or laser-beam characteristics.
Topics covered by the manufacturer
- Our solution for lithography applications
Information required for system selection
Define aperture, wavelength, wavefront range, spatial resolution, required accuracy, test geometry and software interface.
The problem
Wavefront measurements for monitoring and alignment of optical systems. Precise measurements, high intrinsic stability
The method
The optical system uses wavefront sensing and application-specific optics or illumination to quantify optical quality, alignment or laser-beam characteristics.
The result
The delivered configuration must be verified against the operating envelope and performance required by the application.